Location:HOME > PRODUCT > PECVD system

RF power supply

  • Detailed

The PECVD system is composed of tube furnace, quartz vacuum chamber, vacuum system, gas supply system and rf power supply system.Mainly used in: metal film, ceramic film, composite film, graphene and other growth.It is easy to increase the function of plasma cleaning etching and etching.The PECVD system has advantages of high deposition rate, good uniformity, consistency and stability.



Power output range


Maximum reflected power


working frequency


Pw stability


harmonic component


Rf width

0-600mm adjustable

Matching mode


Cooling mode

air cold



 RF interface

 50Ω   N-type

Input power

 208-240V  50/60HZ










Tel/whatsapp/wechat: +86 13913006686
Fax: 025-83111571
“Scan Code Attention”