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RF power supply

  • Detailed

The PECVD system is composed of tube furnace, quartz vacuum chamber, vacuum system, gas supply system and rf power supply system.Mainly used in: metal film, ceramic film, composite film, graphene and other growth.It is easy to increase the function of plasma cleaning etching and etching.The PECVD system has advantages of high deposition rate, good uniformity, consistency and stability.

 

 

Power output range

  0-500W

Maximum reflected power

 200W

working frequency

RF:13.56MHZ±0.005%

Pw stability

+/-0.1%

harmonic component

≤-50dbc

Rf width

0-600mm adjustable

Matching mode

 AUTO

Cooling mode

air cold

 Noise 

 <50dB

 RF interface

 50Ω   N-type

Input power

 208-240V  50/60HZ

 

 

 

 

 

 

 

 

 


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